Synthetic Fused Silica Glass – AQ series

Processed and Polished Products of AQ series

Asahi Glass provides polished synthetic fused silica products based on high-quality starting materials and advanced technologies of ultra-high-precision processing, polishing, and cleaning.

Applications
Photomask Substrate for Semiconductor Manufacturing
Glass Wafer for various applications
(Display Devices・ RF Devices ・MEMSs・Bio-related products・Optical Waveguide etc.)
Template for Nano-Imprint Lithography
Optical Component
(Lens material・Window material・Prism material etc.)
Other Various types of Processed material 

Synthetic fused silica photomask substrates

AGC’s semiconductor photomask substrates cover a range of 4- to 9-inch sizes, chiefly the 6025 size, with the i-ray and KrF grades, ArF grade, and ArF immersion grade available.

Surface roughness : Super-polishing Ra ≦0.2 nm possible

Surface defects : Zero assured for immobile surface defects greater than 0.15μm in size (as tested by an automatic defect inspection machine)

Flatness : Up to 0.3μm (in-plane) assured for the 6025 size

Large photomask substrates for liquid crystal displays can also be processed.

Synthetic quartz wafers

Diameters up to 300 mm (12 inches) and thicknesses down to 0.25 mm are available.
Typical specifications are shown below. Processing with higher precision is also possible.

Diameter φ3”, 4”, 5”, 6”, 8”, 12”
Diameter tolerance ±0.1-0.2mm
Thickness tolerance ±10-50μm
Surface roughness Ra≦0.2-5nm
Warpage ≦20-45μm
Total thickness variation (TTV) ≦3-10μm

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