 |
|
|
 |
|
|
| Made of modified fused silica glass, hard pellicles represent the most promising pellicle for next-generation lithography at 157 nm (F2). | ||||
|
|
|
||
|
||||
|
|
|
||
| Better than 97%
transmission at 157 nm is achieved with AR coatings on both sides of the
membrane. Hard pellicles offer durability superior to organic pellicles, with durability that meets the SEMATECH specification. We've already succeeded in developing a hard pellicle with significantly improved flatness with a high-flatness frame made of synthetic quartz. |
||||
|
|
|
||
 |
||||
|
|
|
|
|
| |
 |
|
|
