The synthetic fused silica glass AQ series is a high-purity, high-quality functional material based on AGCʼs abundant experience accumulated over its long history of technological R&D in fine glasses, fine chemicals, and fine ceramics.

Applications

  • Lens material for Semiconductor lithography system
  • Lens material for FPD lithography equipment
  • Optical parts for various semiconductor manufacturing and measurement equipment
  • Micro Optics (DOE, Microfluidics, etc...)
  • High power laser processing machine
  • UV-LED, Xe Excimer lamp
  • High Frequency Device

AProduction method and Features of AQ series

AGC’s Synthetic Fused Silica AQ series is manufactured by the VAD method. The VAD method can reduce Si-OH content, providing customers with synthetic fused silica with the following features.

Features

  • High transmittance for deep ultraviolet rays with frequencies < 200 nm ranging from the i-ray to KrF, ArF, or Xe excimer lamps, and even for near infrared rays *1
  • Excellent Compaction/Rarefaction and Polarization Induced Birefringence(PIB) characteristics*2
  • Resistant to heat processing around 1000°C*3
  • Excellent durability against high-energy laser beams
  • Thermal expansion as low as 1/10 that of conventional glass
  • High uniformity
  • Very high purity, very low metal impurity content
  • Low OH group content
  • Outstanding chemical resistance
  • Low dielectric loss
  • *DUV-absorption due to electron transition and IR-absorption caused by Si-OH vibration are both reduced.
  • *No rarefaction can be seen in silica glass having low SiOH content such as AGC silica glass. In addition, some ArF excimer laser exposure tests indicate low SiOH containing silica glass has good compaction and PIB characteristics. AGC has installed excimer laser exposure test lines to estimate long-term durability of silica glass. AGC has been diligently researching and developing based on a wealth of the exposure results for a long time.
  • *Decrease in SiOH content makes the Si-O-Si binding network rigid and viscosity high, and consequently makes the heat resistance of silica glass high.

Typical Characteristics

Chemical constitution SiO2 wt(%) 100
Thermal properties CTE ppm/K (50 to 200℃) 0.6
Softening Point ℃ 1600
Annealing Point ℃ 1120
Strain Point ℃ 1060
Optical properties Refractive Index nD 1.46
Chemical properties Acid Resistance mg/cm2 0.000
Alkali Resi mg/cm2 0.032
Mechanical properties Density g/cm3 2.20
Young’s Modulus GPa 74
Knoop Microhardness kg/mm2 540
Electrical properties Bulk Resistivity log(Ω･cm) at 200℃ 12.5
Dielectric Constant at 1MH,R.T. 4.0
  • Data is for reference only.

Transmittance in Deep Ultraviolet Range

  • Data is for reference only.

Product lineup

SDS (Safety Data Sheet) Download
Product catalog
Designation Features and principal applications
AQ The standard grade of AGCʼs synthetic fused silica glass
Application example: Photomask Substrate (~KrF), Glass Wafer, Illumination Optics for i-line (365nm
Life science, UV-LED
AQ3 AQ enhanced in uniformity of refractive index
Application example: Projection Optics for i-line (365nm)
AQ2 High transmittance in vacuum ultraviolet and near infrared
Application example: Optical material for Xe excimer lamp (172nm)
AQT High resistance against deep ultraviolet excimer laser beams along with highly uniform refractive index
Application example: Projection Optics for ArF excimer laser (193nm)
AQR High resistance against deep ultraviolet excimer laser beams
Application example: Illumination Optics for ArF excimer laser (193nm)
QC‐i High transmittance for deep ultraviolet excimer laser beams and low birefringence
Application example: Photomask Substrate material for ArF immersion system

Synthetic quartz glass substrate

AGC provides polished synthetic quartz products based on high-quality starting materials and advanced technologies of ultra-high-precision processing, polishing, and cleaning. Typical specifications are shown below.
Processing with higher precision is also possible.

Wafer □Substrate
Dimension Φ2"、3"、4"、5"、6"、8"、12" □4"、5"、6"
Dimension tolerance ±0.05~0.3mm ±0.05~0.5mm
Thickness 0.2~3mm 0.25~10mm
Thickness tolerance ±0.005~0.05mm ±0.02~0.2mm
Surface roughness(Ra) 0.5~2nm 0.2~2nm
Warpage 10~100µm 0.5~100µm
Total thickness variation (TTV) 1~20µm 5~20µm